Wet etch methods for InAs nanowire patterning and self-aligned electrical contacts

G. Fülöp, S. d'Hollosy, L. Hofstetter, A. Baumgartner, Jesper Nygård, C. Schönenberger, S. Csonka

5 Citations (Scopus)
Original languageEnglish
Article number195303
JournalNanotechnology
Volume27
Issue number19
Number of pages8
ISSN0957-4484
DOIs
Publication statusPublished - 5 Apr 2016

Keywords

  • indium arsenide
  • nanowire
  • patterning
  • lithography
  • wet etch
  • quantum dot
  • galvanic

Fingerprint

Dive into the research topics of 'Wet etch methods for InAs nanowire patterning and self-aligned electrical contacts'. Together they form a unique fingerprint.

Cite this