On the limits to mobility in InAs quantum wells with nearly lattice-matched barriers

B. Shojaei, A. C. C. Drachmann, M. Pendharkar, D. J. Pennachio, M. P. Echlin, P. G. Callahan, S. Kraemer, T. M. Pollock, C. M. Marcus, C. J. Palmstrøm

Abstract

The growth and density dependence of the low temperature mobility of a series of two-dimensional electron systems confined to unintentionally doped, low extended defect density InAs quantum wells with Al1-xGaxSb barriers are reported. The electron-mobility-limiting scattering mechanisms were determined by utilizing dual-gated devices to study the dependence of mobility on carrier density and electric field independently. Analysis of possible scattering mechanisms indicate the mobility was limited primarily by rough interfaces in narrow quantum wells and a combination of alloy disorder and interface roughness in wide wells at high carrier density within the first occupied electronic subband. At low carrier density, the functional dependence of mobility on carrier density provided evidence of Coulombic scattering from charged defects. A gate-tuned electron mobility exceeding 750000cm2V-1s-1 was achieved at a sample temperature of 2 K.

Original languageEnglish
Article number245306
JournalPhysical Review B (Condensed Matter and Materials Physics)
ISSN2469-9950
DOIs
Publication statusPublished - 14 Dec 2016

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