Engineering and metrology of epitaxial graphene

Thomas Bjørnholm; Alexander Tzalenchuk; Samuel Lara-Avila; Karin  Cedergren; Mikael Syväjärvi; Rositza Yakimova; Olga Kazakova; T.J.B.M Janssen; Kasper Moth-Poulsen; Sergey Kopylov; Vladimir  Fal'ko; Sergey Kubatkin

Engineering and metrology of epitaxial graphene

Thomas Bjørnholm, Alexander Tzalenchuk, Samuel Lara-Avila, Karin Cedergren, Mikael Syväjärvi, Rositza Yakimova, Olga Kazakova, T.J.B.M Janssen, Kasper Moth-Poulsen, Sergey Kopylov, Vladimir Fal'ko, Sergey Kubatkin

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18 Citations (Scopus)

Abstract

Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.

Original language	English
Journal	Solid State Communications
Volume	151
Issue number	16
ISSN	0038-1098
Publication status	Published - Aug 2011

Cite this

@article{30e211ed28304246899b9012c7ed999d,

title = "Engineering and metrology of epitaxial graphene",

abstract = "Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.",

author = "Thomas Bj{\o}rnholm and Alexander Tzalenchuk and Samuel Lara-Avila and Karin Cedergren and Mikael Syv{\"a}j{\"a}rvi and Rositza Yakimova and Olga Kazakova and T.J.B.M Janssen and Kasper Moth-Poulsen and Sergey Kopylov and Vladimir Fal'ko and Sergey Kubatkin",

year = "2011",

month = aug,

language = "English",

volume = "151",

journal = "Solid State Communications",

issn = "0038-1098",

publisher = "Pergamon Press",

number = "16",

}

TY - JOUR

T1 - Engineering and metrology of epitaxial graphene

AU - Bjørnholm, Thomas

AU - Tzalenchuk, Alexander

AU - Lara-Avila, Samuel

AU - Cedergren, Karin

AU - Syväjärvi, Mikael

AU - Yakimova, Rositza

AU - Kazakova, Olga

AU - Janssen, T.J.B.M

AU - Moth-Poulsen, Kasper

AU - Kopylov, Sergey

AU - Fal'ko, Vladimir

AU - Kubatkin, Sergey

PY - 2011/8

Y1 - 2011/8

N2 - Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.

AB - Here we review the concepts and technologies, in particular photochemical gating, which contributed to the recent progress in quantum Hall resistance metrology based on large scale epitaxial graphene on silicon carbide.

M3 - Journal article

SN - 0038-1098

VL - 151

JO - Solid State Communications

JF - Solid State Communications

IS - 16

ER -

Engineering and metrology of epitaxial graphene

Abstract

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