Abstract
Relaxation and dephasing of hole spins are measured in a gate-defined Ge/Si nanowire double quantum dot using a fast pulsed-gate method and dispersive readout. An inhomogeneous dephasing time T2(*)≈ 0.18 μs exceeds corresponding measurements in III-V semiconductors by more than an order of magnitude, as expected for predominately nuclear-spin-free materials. Dephasing is observed to be exponential in time, indicating the presence of a broadband noise source, rather than Gaussian, previously seen in systems with nuclear-spin-dominated dephasing.
Originalsprog | Engelsk |
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Artikelnummer | 3582-3586 |
Tidsskrift | Nano Letters |
Vol/bind | 14 |
Udgave nummer | 3582 |
ISSN | 1530-6984 |
DOI | |
Status | Udgivet - 11 jun. 2014 |