Achieving short high-quality gate-all-around structures for horizontal nanowire field-effect transistors

J. G. Gluschke, J. Seidl, A. M. Burke, R. W. Lyttleton, D. J. Carrad, A. R. Ullah, S. Fahlvik, S. Lehmann, H. Linke, A. P. Micolich

9 Citationer (Scopus)

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Material Science