Absolute rate constants for F + CH3CHO and CH3CO + O2, relative rate study of CH3CO + NO, and the product distribution of the F + CH3CHO reaction

Jens Sehested*, Lene K. Christensen, Ole J. Nielsen, Timothy J. Wallington

*Corresponding author for this work
27 Citations (Scopus)

Abstract

Using a pulse-radiolysis transient UV-VIS absorption system, rate constants for the reactions of F atoms with CH3CHO (1) and CH3CO radicals with O2 (2) and NO (3) at 295 K and 1000 mbar total pressure of SF6 was determined to be k1 = (1.4 ± 0.2) × 10-10, k2 = (4.4 ± 0.7) × 10-12, and k3 = (2.4 ± 0.7) × 10-11 cm3 molecule-1 s-1. By monitoring the formation of CH3C(O)O2 radicals (A > 250nm) and NO2 (A = 400.5nm) following radiolysis of SF6/CH3CHO/O2 and SF6/CH3CHO/O2/NO mixtures, respectively, it was deduced that reaction of F atoms with CH3CHO gives (65 ± 9)% CH3CO and (35 ± 9)% HC(O)CH2 radicals. Finally, the data obtained here suggest that decomposition of HC(O)CH2O radicals via C - C bond scission occurs at a rate of <4.7 × 105 S-1.

Original languageEnglish
JournalInternational Journal of Chemical Kinetics
Volume30
Issue number12
Pages (from-to)913-921
Number of pages9
ISSN0538-8066
DOIs
Publication statusPublished - 1 Jan 1998

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