Proximity Effect Transfer from NbTi into a Semiconductor Heterostructure via Epitaxial Aluminum

A C C Drachmann, H J Suominen, Morten Kjærgaard, B Shojaei, C J Palmstrøm, C M Marcus, F Nichele

6 Citationer (Scopus)

Abstract

We demonstrate the transfer of the superconducting properties of NbTi, a large-gap high-critical-field superconductor, into an InAs heterostructure via a thin intermediate layer of epitaxial Al. Two device geometries, a Josephson junction and a gate-defined quantum point contact, are used to characterize interface transparency and the two-step proximity effect. In the Josephson junction, multiple Andreev reflections reveal near-unity transparency with an induced gap Δ* = 0.50 meV and a critical temperature of 7.8 K. Tunneling spectroscopy yields a hard induced gap in the InAs adjacent to the superconductor of Δ* = 0.43 meV with substructure characteristic of both Al and NbTi.

OriginalsprogEngelsk
TidsskriftNano Letters
Vol/bind17
Udgave nummer2
Sider (fra-til)1200-1203
Antal sider4
ISSN1530-6984
DOI
StatusUdgivet - 8 feb. 2017

Fingeraftryk

Dyk ned i forskningsemnerne om 'Proximity Effect Transfer from NbTi into a Semiconductor Heterostructure via Epitaxial Aluminum'. Sammen danner de et unikt fingeraftryk.

Citationsformater