Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators

Thibault Capelle, Y. Tsaturyan, A. Barg, A. Schliesser

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@article{0244488a9d7f401fbf771ca598a4e1d3,

title = "Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators",

author = "Thibault Capelle and Y. Tsaturyan and A. Barg and A. Schliesser",

year = "2017",

month = may,

day = "1",

doi = "10.1063/1.4982876",

language = "English",

volume = "110",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "18",

}

TY - JOUR

T1 - Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators

AU - Capelle, Thibault

AU - Tsaturyan, Y.

AU - Barg, A.

AU - Schliesser, A.

PY - 2017/5/1

Y1 - 2017/5/1

U2 - 10.1063/1.4982876

DO - 10.1063/1.4982876

M3 - Journal article

SN - 0003-6951

VL - 110

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 18

M1 - 181106

ER -