Nanometer-scale scanning sensors fabricated using stencil lithography

TY - JOUR

T1 - Nanometer-scale scanning sensors fabricated using stencil lithography

AU - Champagne, A R

AU - Couture, A J

AU - Kuemmeth, Ferdinand

AU - Ralph, D C

PY - 2003/1/1

Y1 - 2003/1/1

N2 - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

AB - We describe a flexible technique for fabricating 10-nm-scale devices for use as high-resolution scanning sensors and functional probes. Metallic structures are deposited directly onto atomic force microscope tips by evaporation through nanoscale holes fabricated in a stencil mask. We report on the lithographic capabilities of the technique and discuss progress in one initial application, to make high-spatial-resolution magnetic force sensors.

U2 - 10.1063/1.1554483

DO - 10.1063/1.1554483

M3 - Journal article

SN - 0003-6951

VL - 82

SP - 1111

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 7

ER -