Measuring multiple nano-textured areas simultaneously with imaging scatterometry

TY - GEN

T1 - Measuring multiple nano-textured areas simultaneously with imaging scatterometry

AU - Madsen, Jonas Skovlund

AU - Hansen, Poul Erik

AU - Bilenberg, Brian

AU - Nygård, Jesper

AU - Madsen, Morten Hannibal

N1 - Conference code: 16

PY - 2017

Y1 - 2017

N2 - Periodic nano- Textured surfaces have been characterised using the new optical imaging scatterometry technique. A major benefit of imaging scatterometry compared to traditional scatterometry is that an area much smaller than the illuminated area can be analysed. That is, instead of averaging over the full illumination spot, scatterometry analysis can be made pixel by pixel. An area of interest much smaller than the spot size can therefore be characterized and the user first has to select the area of interest in the post-processing. Furthermore, a specific area on the sample can easily be found and areas with defects can be avoided. These advantages make imaging scatterometry a very effective and user-friendly characterization method and allow us to determine the homogeneity of a nano- Textured surface by performing pixel-wise analyses. In the analysis an inverse modelling approach is used, where measured diffraction efficiencies are compared to simulated diffraction efficiencies using a least-square fitting approach. We demonstrate an imaging scatterometry setup built into an optical microscope. The setup is capable of measuring multiple 2D gratings with pitches of 200 nm simultaneously. It is demonstrated that the imaging scatterometer can measure 2D nano- Textured surfaces with an accuracy of a few nm for the depth and width of the structures on areas down to 3 x 3 μm2.

AB - Periodic nano- Textured surfaces have been characterised using the new optical imaging scatterometry technique. A major benefit of imaging scatterometry compared to traditional scatterometry is that an area much smaller than the illuminated area can be analysed. That is, instead of averaging over the full illumination spot, scatterometry analysis can be made pixel by pixel. An area of interest much smaller than the spot size can therefore be characterized and the user first has to select the area of interest in the post-processing. Furthermore, a specific area on the sample can easily be found and areas with defects can be avoided. These advantages make imaging scatterometry a very effective and user-friendly characterization method and allow us to determine the homogeneity of a nano- Textured surface by performing pixel-wise analyses. In the analysis an inverse modelling approach is used, where measured diffraction efficiencies are compared to simulated diffraction efficiencies using a least-square fitting approach. We demonstrate an imaging scatterometry setup built into an optical microscope. The setup is capable of measuring multiple 2D gratings with pitches of 200 nm simultaneously. It is demonstrated that the imaging scatterometer can measure 2D nano- Textured surfaces with an accuracy of a few nm for the depth and width of the structures on areas down to 3 x 3 μm2.

KW - Instrumentation

KW - Nanometrology

KW - Nanostructures

KW - Scatterometry

UR - http://www.scopus.com/inward/record.url?scp=84984598934&partnerID=8YFLogxK

M3 - Article in proceedings

AN - SCOPUS:84984598934

BT - Proceedings of the 16th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2016

A2 - Bointon, P.

A2 - Leach, R.

A2 - Southon, N.

PB - euspen

CY - Nottingham, UK

T2 - 16th International Conference of the European Society for Precision Engineering and Nanotechnology

Y2 - 30 May 2016 through 3 June 2016

ER -