Implications of X-ray thermal diffuse scattering in integrated Bragg intensities of silicon and cubic boron nitride

3 Citationer (Scopus)

Originalsprog	Engelsk
Tidsskrift	Journal of Applied Crystallography
Vol/bind	50
Sider (fra-til)	1791-1799
ISSN	1600-5767
DOI	https://doi.org/10.1107/S1600576717014376
Status	Udgivet - dec. 2017

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@article{daf85ed8c6364b1d802c967ce8a7f995,

title = "Implications of X-ray thermal diffuse scattering in integrated Bragg intensities of silicon and cubic boron nitride",

keywords = "thermal diffuse scattering, Debye-Waller factors, ab initio calculations, charge-density studies",

author = "Nanna Wahlberg and Madsen, {Anders Ostergaard}",

year = "2017",

month = dec,

doi = "10.1107/S1600576717014376",

language = "English",

volume = "50",

pages = "1791--1799",

journal = "Journal of Applied Crystallography",

issn = "1600-5767",

publisher = "Wiley-Blackwell",

}

TY - JOUR

T1 - Implications of X-ray thermal diffuse scattering in integrated Bragg intensities of silicon and cubic boron nitride

AU - Wahlberg, Nanna

AU - Madsen, Anders Ostergaard

PY - 2017/12

Y1 - 2017/12

KW - thermal diffuse scattering

KW - Debye-Waller factors

KW - ab initio calculations

KW - charge-density studies

U2 - 10.1107/S1600576717014376

DO - 10.1107/S1600576717014376

M3 - Journal article

SN - 1600-5767

VL - 50

SP - 1791

EP - 1799

JO - Journal of Applied Crystallography

JF - Journal of Applied Crystallography

ER -